| Ellipsometer for thin films |
Thin Film Metrology
- Spectroscopic Ellipsometry from DUV to NIR
- Combined Laser Ellipsometry & Reflectometry *
Applications include:
- Film thickness & optical constants
- Broad range of applications from ultra-thin films to complex multilayer stacks
- Reflection and transmission data
Advanced Process Control
- Optical Emission Spectroscopy
- Imaging Interferometry
- Depth polarimetry
Applications include:
- Real-time plasma analysis
- Advanced Endpoint detection
- In-situ trench depth monitoring
- Analytical Laser Ellipsometry
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| Spectroscopic Ellipsometers |
| UVISEL |
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Benchtop Spectroscopic Ellipsometer |
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Fully Integrated Spectroscopic Ellipsometer Configuration |
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A standard spectral range for common thin film metrology applications
The standard UVISEL spectroscopic ellipsometer covers a standard spectral range from 240 to 830 nm, and can be easily extended in both FUV and NIR range (see next models). It is also possible to automate the instrument to enhance its performance and range of application by adding many available options.
The standard UVISEL ellipsometer is ideally suited for research and development applications in a variety of fields, including semiconductor, displays, optical coatings, chemistry and biology. |
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The UVISEL Spectroscopic Phase Modulated Ellipsometer (SPME) is a unique instrument that incorporates photoelastic device to modulate the polarization without any mechanical movement. This key technology allows delivery of the highest combination of accuracy, reproducibility and ease-of-use for demanding research and industrial QC applications. The UVISEL Spectroscopic Phase Modulated Ellipsometer brings together field-proven versatility and performance to best match the system capabilities to your experiment's demand.
- Very high precision and sensitivity.
- High stability.
- The highest signal/noise ratio from 190 to 2100 nm.
- The smallest spot size.
- Modular design.
- Powerful, customizable and intuitive software.
A broad variety of spectroscopic ellipsometry instruments have been developed : they cover a wide spectral range from 190 to 2100 nm, and offer full upgradeability required for a wide range of applications.
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UVISEL NIR |
Dedicated to NIR applications and high resolution measurements
The UVISEL NIR spectroscopic ellipsometer extends the UVISEL in the near infrared spectral range up to 2100 nm.
It uses a very high spectral resolution monochromator (HR-460) automatically controlled (choice of gratings, slits and detectors) for continuous measurements over the whole range. The UV/Vis range is covered by a photomultiplier detector while the NIR range uses an InGaAs photodiode.
The thicker the film, the more interference oscillations vs. wavelength. For film thicknesses above 5 µm a high resolution monochromator configuration is often required to well resolve interference fringes.
The spectral range of an ellipsometer is very important as it determines the possible applications. Longer wavelengths ensure a transparent region for thickness measurements in most materials.
Main applications are dedicated to telecommunications field (laser diodes, filters, AR&HR coatings, waveguides) as well as accurate characterization of ultra-thick films. more>>
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High light throughput and the best signal/noise ratio in the FUV range
The UVISEL FUV spectroscopic ellipsometer extends the UVISEL down to 190 nm.
The FUV200 monochromator designed in-house integrates two different detectors (a solar blind and UV/vis PMT detectors) to provide an extremely low level of stray light. Thus combined with high throughput optics this UVISEL FUV ellipsometer is recognized to provide very high sensitivity and precision without compromise.
The FUV range is often required for lithography applications, characterisation of metals, high k and organic materials as well as increases sensitivity to ultra-thin films.
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Unsurpassed flexibility for a wide range of applications
The UVISEL ER - Extended Range - spectroscopic ellipsometer covers a wide spectral range from 190 to 2100 nm. It combines the use of the two monochromators : FUV200 and HR460.
This ellipsometer is highly featured for advanced thin film characterization. Its modular design allows the ultimate in flexibility to tailor the system capabilities to your experiment's demands.
The UVISEL ER spectroscopic ellipsometer provides very high performance, while the common based DP2 software platform offers broad functionality to cover a large variety of scientific and industrial applications.
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| UT-300 |
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Fully Automated Spectroscopic Ellipsometer for the Semiconductor Industry
On-line Control Oriented System dedicated to the Semiconductor Industry
The UT-300 - Fully Automatic Spectroscopic Ellipsometer is specially developed to provide specific process control solutions for the semiconductor industry.
Equipped with achromatic microspot optics, wafer handling system, autofocus and pattern recognition software the UT-300 provides unique capabilities for analysing demanding thin film structures at a throughput in excess of 100 wafers/hour. The instrument has a far-UV option (190 nm) and is compatible with 6", 8" and 12" wafers.
The UT-300 spectroscopic ellipsometer presents high level of performance in terms of accuracy and stability tailored for qualification and on-line production control.
The integrated DeltaPsi2 software package has been designed to process ellipsometric data simply and reliably. Routine tasks are performed fully automatically to meet production needs.
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| Laser Ellipsometers |
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Benchtop Laser Ellipsometer |
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Combined Laser Ellipsometer and Reflectometer |
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Combined Laser Ellipsometer and Reflectometer for In Line Process Control |
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